Due to their speed, data density, and versatility, optical metrology tools play important roles in today's high-speed industrial manufacturing applications. Handbook of Optical Dimensional Metrology provides useful background information and practical examples to help readers understand and effectively use state-of-the-art optical metrology methods

This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook.

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.

Providing comprehensive, state-of-the-art treatment of all known dimensional measurement devices and techniques, this unique and updated resource is organized into chapters by gage type and function, while individual chapters move from simple to complex, as well as from timeless measurement techniques to the most modern and innovative.

Established by Congress in 1901, the National Bureau of Standards (NBS), now the National Institute of Standards and Technology (NIST), has a long and distinguished history as the custodian and disseminator of the United States' standards of physical measurement. Having reached its centennial anniversary, the NBS/NIST reflects on and celebrates its first century with this book describing some of its seminal contributions to science and technology. Within these pages are 102 vignettes that describe some of the Institute's classic publications. Each vignette relates the context in which the publication appeared, its impact on science, technology, and the general public, and brief details about the lives and work of the authors. The groundbreaking works depicted include: A breakthrough paper on laser-cooling of atoms below the Doppler limit, which led to the award of the 1997 Nobel Prize for Physics to William D. Phillips The official report on the development of the radio proximity fuse, one of the most important new weapons of World War II The 1932 paper reporting the discovery of deuterium in experiments that led to Harold Urey's1934 Nobel Prize for Chemistry A review of the development of the SEAC, the first digital computer to employ stored programs and the first to process images in digital form The first paper demonstrating that parity is not conserved in nuclear physics, a result that shattered a fundamental concept of theoretical physics and led to a Nobel Prize for T. D. Lee and C. Y. Yang "Observation of Bose-Einstein Condensation in a Dilute Atomic Vapor," a 1995 paper that has already opened vast new areas of research A landmark contribution to the field of protein crystallography by Wlodawer and coworkers on the use of joint x-ray and neutron diffraction to determine the structure of proteins

3D and 4D metallic printing principles, practices, and applications This practical guide clearly explains the tools and methods necessary to bridge the performance gap between conventionally produced and printed parts. Written by a metals expert and experienced educator, Additive Manufacturing of Metals: Fundamentals and Testing of 3- and 4-D Printing starts by explaining the basics, including components, metals, and production processes before progressing to more advanced topics. You will get complete discussions on issues related to the lack of regulation and standardization, mechanical behavior of printed parts, defects, measurements, and quality control. In addition, the book also discusses predictions for the future of the technology. It presents the potential obstacles that may limit its universal adoption across the manufacturing landscape. Coverage includes: Additive manufacturing fundamentals History of additive manufacturing Metal properties and data Feedstock for metal additive manufacturing processes Power considerations in metal additive manufacturing Technical gaps Powder morphology Powder characterization and measurement of properties Defects encountered in the build Mechanical behavior of printed parts Metrology and surface roughness issues in metal printing Future trends

This volume is the only book to describe in detail all aspects of plastic optics from design issues to production technology and quality control aspects. Throughout, the focus is firmly set on practical applications, making this an indispensable source of information for all those working in optics research and development. Topics covered in this volume include: Opto-mechanical design Processing Tooling Materials Metrology Equipment Applications

Proceedings of SPIE present the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields. Proceedings of SPIE are among the most cited references in patent literature.