The Handbook Series on Semiconductor Parameters will consist of 5 volumes and will include data on the most popular semiconductor materials. These volumes aim to be a basic reference for scientists, engineers, students and technicians working in semiconductor materials and devices. The books have been kept compact but comprehensive and contain the values of frequently needed parameters selected and commented by leading experts on these materials. The first volume will include data on Si, Ge, diamond, GaAs, GaP, GaSb, InAs, InP, and InSb.

The Handbook Series on Semiconductor Parameters will consist of 5 volumes and will include data on the most popular semiconductor materials. These volumes aim to be a basic reference for scientists, engineers, students and technicians working in semiconductor materials and devices. The books have been kept compact but comprehensive and contain the values of frequently needed parameters selected and commented by leading experts on these materials. The first volume will include data on Si, Ge, diamond, GaAs, GaP, GaSb, InAs, InP, and InSb

The Handbook Series on Semiconductor Parameters will consist of 5 volumes and will include data on the most popular semiconductor materials. These volumes aim to be a basic reference for scientists, engineers, students and technicians working in semiconductor materials and devices. The books have been kept compact but comprehensive and contain the values of frequently needed parameters selected and commented by leading experts on these materials. The first volume will include data on Si, Ge, diamond, GaAs, GaP, GaSb, InAs, InP, and InSb.

The Handbook Series on Semiconductor Parameters will consist of 5 volumes and will include data on the most popular semiconductor materials. These volumes aim to be a basic reference for scientists, engineers, students and technicians working in semiconductor materials and devices. The books have been kept compact but comprehensive and contain the values of frequently needed parameters selected and commented by leading experts on these materials. The first volume will include data on Si, Ge, diamond, GaAs, GaP, GaSb, InAs, InP, and InSb.

This book focusses on III-V high electron mobility transistors (HEMTs) including basic physics, material used, fabrications details, modeling, simulation, and other important aspects. It initiates by describing principle of operation, material systems and material technologies followed by description of the structure, I-V characteristics, modeling of DC and RF parameters of AlGaN/GaN HEMTs. The book also provides information about source/drain engineering, gate engineering and channel engineering techniques used to improve the DC-RF and breakdown performance of HEMTs. Finally, the book also highlights the importance of metal oxide semiconductor high electron mobility transistors (MOS-HEMT). Key Features Combines III-As/P/N HEMTs with reliability and current status in single volume Includes AC/DC modelling and (sub)millimeter wave devices with reliability analysis Covers all theoretical and experimental aspects of HEMTs Discusses AlGaN/GaN transistors Presents DC, RF and breakdown characteristics of HEMTs on various material systems using graphs and plots

Top-Down VLSI Design: From Architectures to Gate-Level Circuits and FPGAs represents a unique approach to learning digital design. Developed from more than 20 years teaching circuit design, Doctor Kaeslin's approach follows the natural VLSI design flow and makes circuit design accessible for professionals with a background in systems engineering or digital signal processing. It begins with hardware architecture and promotes a system-level view, first considering the type of intended application and letting that guide your design choices. Doctor Kaeslin presents modern considerations for handling circuit complexity, throughput, and energy efficiency while preserving functionality. The book focuses on application-specific integrated circuits (ASICs), which along with FPGAs are increasingly used to develop products with applications in telecommunications, IT security, biomedical, automotive, and computer vision industries. Topics include field-programmable logic, algorithms, verification, modeling hardware, synchronous clocking, and more. - Demonstrates a top-down approach to digital VLSI design. - Provides a systematic overview of architecture optimization techniques. - Features a chapter on field-programmable logic devices, their technologies and architectures. - Includes checklists, hints, and warnings for various design situations. - Emphasizes design flows that do not overlook important action items and which include alternative options when planning the development of microelectronic circuits.

"The fourth edition of this book has been widely revised. It includes additional chapters and some sections are complemented with either new ones or an extension of their content. In this latest edition a complete treatment of the physics and properties of semiconductors is presented, covering transport phenomena in semiconductors, scattering mechanisms, radiation effects and displacement damages. Furthermore, this edition presents a comprehensive treatment of the Coulomb scattering on screened nuclear potentials resulting from electrons, protons, light- and heavy-ions -- ranging from (very) low up to ultra-relativistic kinetic energies -- and allowing one to derive the corresponding NIEL (non-ionizing energy-loss) doses deposited in any material. The contents are organized into two parts: Chapters 1 to 7 cover Particle Interactions and Displacement Damage while the remaining chapters focus on Radiation Environments and Particle Detection. This book can serve as reference for graduate students and final-year undergraduates and also as supplement for courses in particle, astroparticle, space physics and instrumentation. A section of the book is directed toward courses in medical physics. Researchers in experimental particle physics at low, medium, and high energy who are dealing with instrumentation will also find the book useful."--

This book, like the first and second editions, addresses the fundamental principles of interaction between radiation and matter and the principles of particle detection and detectors in a wide scope of fields, from low to high energy, including space physics and medical environment. It provides abundant information about the processes of electromagnetic and hadronic energy deposition in matter, detecting systems, performance of detectors and their optimization. The third edition includes additional material covering, for instance: mechanisms of energy loss like the inverse Compton scattering, corrections due to the LandauOCoPomeranchukOCoMigdal effect, an extended relativistic treatment of nucleusOConucleus screened Coulomb scattering, and transport of charged particles inside the heliosphere. Furthermore, the displacement damage (NIEL) in semiconductors has been revisited to account for recent experimental data and more comprehensive comparisons with results previously obtained. This book will be of great use to graduate students and final-year undergraduates as a reference and supplement for courses in particle, astroparticle, space physics and instrumentation. A part of the book is directed toward courses in medical physics. The book can also be used by researchers in experimental particle physics at low, medium, and high energy who are dealing with instrumentation."

This book, like the first and second editions, addresses the fundamental principles of interaction between radiation and matter and the principles of particle detection and detectors in a wide scope of fields, from low to high energy, including space physics and medical environment. It provides abundant information about the processes of electromagnetic and hadronic energy deposition in matter, detecting systems, performance of detectors and their optimization.The third edition includes additional material covering, for instance: mechanisms of energy loss like the inverse Compton scattering, corrections due to the Landau-Pomeranchuk-Migdal effect, an extended relativistic treatment of nucleus-nucleus screened Coulomb scattering, and transport of charged particles inside the heliosphere. Furthermore, the displacement damage (NIEL) in semiconductors has been revisited to account for recent experimental data and more comprehensive comparisons with results previously obtained.This book will be of great use to graduate students and final-year undergraduates as a reference and supplement for courses in particle, astroparticle, space physics and instrumentation. A part of the book is directed toward courses in medical physics. The book can also be used by researchers in experimental particle physics at low, medium, and high energy who are dealing with instrumentation.

This book presents the material necessary for understanding the physics, operation, design, and performance of modern MOSFETs with nanometer dimensions. It offers a brief introduction to the field and a thorough overview of MOSFET physics, detailing the relevant basics. The authors apply presented models to calculate and demonstrate transistor characteristics, and they include required input data (e.g., dimensions, doping) enabling readers to repeat the calculations and compare their results. The book introduces conventional and novel advanced MOSFET concepts, such as multiple-gate structures or alternative channel materials. Other topics covered include high-k dielectrics and mobility enhancement techniques, MOSFETs for RF (radio frequency) applications, MOSFET fabrication technology.