This book describes how to see atoms using electron microscopes. This new edition includes updated sections on applications and new uses of atomic-resolution transmission electron microscopy. Several new chapters and sources of software for image interpretation and electron-optical design have also been added.

This new fourth edition of the standard text on atomic-resolution transmission electron microscopy (TEM) retains previous material on the fundamentals of electron optics and aberration correction, linear imaging theory (including wave aberrations to fifth order) with partial coherence, and multiple-scattering theory. Also preserved are updated earlier sections on practical methods, with detailed step-by-step accounts of the procedures needed to obtain the highest quality images of atoms and molecules using a modern TEM or STEM electron microscope. Applications sections have been updated - these include the semiconductor industry, superconductor research, solid state chemistry and nanoscience, and metallurgy, mineralogy, condensed matter physics, materials science and material on cryo-electron microscopy for structural biology. New or expanded sections have been added on electron holography, aberration correction, field-emission guns, imaging filters, super-resolution methods, Ptychography, Ronchigrams, tomography, image quantification and simulation, radiation damage, the measurement of electron-optical parameters, and detectors (CCD cameras, Image plates and direct-injection solid state detectors). The theory of Scanning transmission electron microscopy (STEM) and Z-contrast are treated comprehensively. Chapters are devoted to associated techniques, such as energy-loss spectroscopy, Alchemi, nanodiffraction, environmental TEM, twisty beams for magnetic imaging, and cathodoluminescence. Sources of software for image interpretation and electron-optical design are given.

High-resolution electron microscopy (HREM) has become a most powerful method for investigating the internal structure of materials on an atomic scale of around 0.1 nm. The authors clearly explain both the theory and practice of HREM for materials science. In addition to a fundamental formulation of the imaging process of HREM, there is detailed explanation of image simulationindispensable for interpretation of high-resolution images. Essential information on appropriate imaging conditions for observing lattice images and structure images is presented, and methods for extracting structural information from these observations are clearly shown, including examples in advanced materials. Dislocations, interfaces, and surfaces are dealt with, and materials such as composite ceramics, high-Tc superconductors, and quasicrystals are also considered. Included are sections on the latest instruments and techniques, such as the imaging plate and quantitative HREM.

In-situ high-resolution electron microscopy is a modern and powerful technique in materials research, physics, and chemistry. In-situ techniques are hardly treated in textbooks of electron microscopy. Thus, there is a need to collect the present knowledge about the techniques and achievements of in-situ electron microscopy in one book. Since high-resolution electron microscopes are available in most modern laboratories of materials science, more and more scientists or students are starting to work on this subject.In this comprehensive volume, the most important techniques and achievements of in-situ high-resolution electron microscopy will be reviewed by renowned experts. Applications in several fields of materials science will also be demonstrated.

Nanostructured materials take on an enormously rich variety of properties and promise exciting new advances in micromechanical, electronic, and magnetic devices as well as in molecular fabrications. The structure-composition-processing-property relationships for these sub 100 nm-sized materials can only be understood by employing an array of modern microscopy and microanalysis tools. Handbook of Microscopy for Nanotechnology aims to provide an overview of the basics and applications of various microscopy techniques for nanotechnology. This handbook highlights various key microcopic techniques and their applications in this fast-growing field. Topics to be covered include the following: scanning near field optical microscopy, confocal optical microscopy, atomic force microscopy, magnetic force microscopy, scanning turning microscopy, high-resolution scanning electron microscopy, orientational imaging microscopy, high-resolution transmission electron microscopy, scanning transmission electron microscopy, environmental transmission electron microscopy, quantitative electron diffraction, Lorentz microscopy, electron holography, 3-D transmission electron microscopy, high-spatial resolution quantitative microanalysis, electron-energy-loss spectroscopy and spectral imaging, focused ion beam, secondary ion microscopy, and field ion microscopy.

Derived from the successful three-volume Handbook of Microscopy, this book provides a broad survey of the physical fundamentals and principles of all modern techniques of electron microscopy. This reference work on the method most often used for the characterization of surfaces offers a competent comparison of the feasibilities of the latest developments in this field of research. Topics include: * Stationary Beam Methods: Transmission Electron Microscopy/ Electron Energy Loss Spectroscopy/ Convergent Electron Beam Diffraction/ Low Energy Electron Microscopy/ Electron Holographic Methods * Scanning Beam Methods: Scanning Transmission Electron Microscopy/ Scanning Auger and XPS Microscopy/ Scanning Microanalysis/ Imaging Secondary Ion Mass Spectrometry * Magnetic Microscopy: Scanning Electron Microscopy with Polarization Analysis/ Spin Polarized Low Energy Electron Microscopy Materials scientists as well as any surface scientist will find this book an invaluable source of information for the principles of electron microscopy.

This book presents advances in nanoscale imaging capabilities of scanning transmission electron microscopes, along with superresolution techniques, special denoising methods, application of mathematical/statistical learning theory, and compressed sensing.

The aim of this monograph is to outline the physics of image formation, electron–specimen interactions, and image interpretation in transmission el- tron microscopy. Since the last edition, transmission electron microscopy has undergone a rapid evolution. The introduction of monochromators and - proved energy ?lters has allowed electron energy-loss spectra with an energy resolution down to about 0.1 eV to be obtained, and aberration correctors are now available that push the point-to-point resolution limit down below 0.1 nm. After the untimely death of Ludwig Reimer, Dr. Koelsch from Springer- Verlag asked me if I would be willing to prepare a new edition of the book. As it had served me as a reference for more than 20 years, I agreed without hesitation. Distinct from more specialized books on speci?c topics and from books intended for classroom teaching, the Reimer book starts with the basic principles and gives a broad survey of the state-of-the-art methods, comp- mented by a list of references to allow the reader to ?nd further details in the literature. The main objective of this revised edition was therefore to include the new developments but leave the character of the book intact. The presentation of the material follows the format of the previous e- tion as outlined in the preface to that volume, which immediately follows. A few derivations have been modi?ed to correspond more closely to modern textbooks on quantum mechanics, scattering theory, or solid state physics.