Laser processing is now a rapidly increasing field with many real and potential applications in different areas of technology such as micromecha nics, metallurgy, integrated optics, and semiconductor device fabrication. The neces s ity for such soph i st i cated 1 i ght sources as 1 asers is based on the spatial coherence and the monochromaticity of laser light. The spatial coherence permits extreme focussing of the laser light resulting in the availability of high energy densities which can be used for strongly loca lized heat- and chemical-treatment of materials, with a resolution down to 1 ess than 1 lJIll. When us i ng pul sed or scanned cw-l asers, 1 oca 1 i zat i on in time is also possible. Additionally, the monochromaticity of laser light allows for control of the depth of heat treatment and/or selective, nonthermal bond breaking - within the surface of the material or within the molecules of the surrounding reactive atmosphere - simply by tuning the laser wavelength. These inherent advantages of laser light permit micromachining of materials (drilling, cutting, welding etc.) and also allow single-step controlled area processing of thin films and surfaces. Processes include structural transformation (removal of residual damage, grain growth in polycrystalline material, amorphization, surface hardening etc.), etching, doping, alloying, or deposition. In addition, laser processing is not 1 imited to planar substrates.

Tighter regulations of harmful substances such as NOx, CO, heavy metals, particles, emissions from commercial plants and automobiles reflect a growing demand for lowering the anthropogenic burdens on the environment. It is equally important to monitor controlling factors to improve the operation of industrial machinery and plants. Among the many me

Updated and expanded from the original Japanese edition, Laser-Aided Diagnostics of Gases and Plasmas takes a unique approach in treating laser-aided diagnostics. The book unifies the subject by joining applications instead of describing each application as a totally separate system. In taking this approach, it highlights the relative strengths of

As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics.

The MRS Symposium Proceeding series is an internationally recognised reference suitable for researchers and practitioners.

Laser-Assisted Microtechnology deals with laser applications to a wide variety of problems in microelectronic design and fabrication. It covers micromachining of thin films, microprocessing of materials, maskless laser micropatterning and laser-assisted synthesis of thin-film systems. The monograph describes fundamental aspects and practical details of the technological processes as well as the optimum conditions for their realization.

Early diagnosis of cancer and other non-oncological disorders gives a significant advantage for curing the disease and improving patient's life expectancy. Recent advances in biosensor-based techniques which are designed for specific biomarkers can be exploited for early diagnosis of diseases. Biosensor Based Advanced Cancer Diagnostics covers all available biosensor-based approaches and comprehensive technologies; along with their application in diagnosis, prognosis and therapeutic management of various oncological disorders. Besides this, current challenges and future aspects of these diagnostic approaches have also been discussed. This book offers a view of recent advances and is also helpful for designing new biosensor-based technologies in the field of medical science, engineering and biomedical technology. Biosensor Based Advanced Cancer Diagnostics helps biomedical engineers, researchers, molecular biologists, oncologists and clinicians with the development of point of care devices for disease diagnostics and prognostics. It also provides information on developing user friendly, sensitive, stable, accurate, low cost and minimally invasive modalities which can be adopted from lab to clinics. This book covers in-depth knowledge of disease biomarkers that can be exploited for designing and development of a range of biosensors. The editors have summarized the potential cancer biomarkers and methodology for their detection, plus transferring the developed system to clinical application by miniaturization and required integration with microfluidic systems. - Covers design and development of advanced platforms for rapid diagnosis of cancerous biomarkers - Takes a multidisciplinary approach to sensitive transducers development, nano-enabled advanced imaging, miniaturized analytical systems, and device packaging for point-of-care applications - Offers an insight into how to develop cost-effective diagnostics for early detection of cancer

In spite of its high cost and technical importance, plasma equipment is still largely designed empirically, with little help from computer simulation. Plasma process control is rudimentary. Optimization of plasma reactor operation, including adjustments to deal with increasingly stringent controls on plant emissions, is performed predominantly by trial and error. There is now a strong and growing economic incentive to improve on the traditional methods of plasma reactor and process design, optimization, and control. An obvious strategy for both chip manufacturers and plasma equipment suppliers is to employ large-scale modeling and simulation. The major roadblock to further development of this promising strategy is the lack of a database for the many physical and chemical processes that occur in the plasma. The data that are currently available are often scattered throughout the scientific literature, and assessments of their reliability are usually unavailable. "Database Needs for Modeling and Simulation of Plasma Processing" identifies strategies to add data to the existing database, to improve access to the database, and to assess the reliability of the available data. In addition to identifying the most important needs, this report assesses the experimental and theoretical/computational techniques that can be used, or must be developed, in order to begin to satisfy these needs.

Laser cleaning is very important for modern high technology. It is used, or considered for use in the fabrication of printed circuit boards, in the production of dynamic random access memory (DRAM), in lithography and epitaxial growth, for the removal of contaminations during via-hole production, and for the cleaning of micro-optical and micro-mechanical components.This invaluable book presents the mechanics of the cleaning processes, experimental results, and different applications, including laser cleaning of art. It contains review articles by leading specialists in laser cleaning who participated in the 1st International Workshop on Laser Cleaning, held in Singapore in 2001.