Molecular Dynamics Simulations Of Plasma Surface Interactions

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Genre :
Author : Joseph James Végh
Publisher :
Release : 2007
File : 540 Pages
ISBN-13 : UCAL:C3510363


Molecular Dynamics Simulations Of Plasma Surface Chemistry

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Genre :
Author : Cameron Frank Abrams
Publisher :
Release : 2000
File : 520 Pages
ISBN-13 : UCAL:C3447114


Atomistic Simulations Of Plasma Surface Interactions

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Genre :
Author : Maria Eve Barone
Publisher :
Release : 1995
File : 350 Pages
ISBN-13 : UCAL:C3386391


Plasma Surface Interactions And Processing Of Materials

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An understanding of the processes involved in the basic and applied physics and chemistry of the interaction of plasmas with materials is vital to the evolution of technologies such as those relevant to microelectronics, fusion and space. The subjects dealt with in the book include: the physics and chemistry of plasmas, plasma diagnostics, physical sputtering and chemical etching, plasma assisted deposition of thin films, ion and electron bombardment, and plasma processing of inorganic and polymeric materials. The book represents a concentration of a substantial amount of knowledge acquired in this area - knowledge which was hitherto widely scattered throughout the literature - and thus establishes a baseline reference work for both established and tyro research workers.

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Genre : Science
Author : O. Auciello
Publisher : Springer Science & Business Media
Release : 2012-12-06
File : 548 Pages
ISBN-13 : 9789400919464


Computional Studies Of Plasma Surface Interactions

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Author : David W. Humbird
Publisher :
Release : 2004
File : 524 Pages
ISBN-13 : UCAL:C3493657


Plasma Processing Of Nanomaterials

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We are at a critical evolutionary juncture in the research and development of low-temperature plasmas, which have become essential to synthesizing and processing vital nanoscale materials. More and more industries are increasingly dependent on plasma technology to develop integrated small-scale devices, but physical limits to growth, and other challenges, threaten progress. Plasma Processing of Nanomaterials is an in-depth guide to the art and science of plasma-based chemical processes used to synthesize, process, and modify various classes of nanoscale materials such as nanoparticles, carbon nanotubes, and semiconductor nanowires. Plasma technology enables a wide range of academic and industrial applications in fields including electronics, textiles, automotives, aerospace, and biomedical. A prime example is the semiconductor industry, in which engineers revolutionized microelectronics by using plasmas to deposit and etch thin films and fabricate integrated circuits. An overview of progress and future potential in plasma processing, this reference illustrates key experimental and theoretical aspects by presenting practical examples of: Nanoscale etching/deposition of thin films Catalytic growth of carbon nanotubes and semiconductor nanowires Silicon nanoparticle synthesis Functionalization of carbon nanotubes Self-organized nanostructures Significant advances are expected in nanoelectronics, photovoltaics, and other emerging fields as plasma technology is further optimized to improve the implementation of nanomaterials with well-defined size, shape, and composition. Moving away from the usual focus on wet techniques embraced in chemistry and physics, the author sheds light on pivotal breakthroughs being made by the smaller plasma community. Written for a diverse audience working in fields ranging from nanoelectronics and energy sensors to catalysis and nanomedicine, this resource will help readers improve development and application of nanomaterials in their own work. About the Author: R. Mohan Sankaran received the American Vacuum Society’s 2011 Peter Mark Memorial Award for his outstanding contributions to tandem plasma synthesis.

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Genre : Science
Author : R. Mohan Sankaran
Publisher : CRC Press
Release : 2017-12-19
File : 417 Pages
ISBN-13 : 9781439866771


Molecular Modeling And Theory In Chemical Engineering

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In recent years chemical engineers have become increasingly involved in the design and synthesis of new materials and products as well as the development of biological processes and biomaterials. Such applications often demand that product properties be controlled with precision. Molecular modeling, simulating chemical and molecular structures or processes by computer, aids scientists in this endeavor. Volume 28 of Advances in Chemical Engineering presents discussions of theoretical and computational methods as well as their applications to specific technologies.

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Genre : Technology & Engineering
Author : James Wei
Publisher : Elsevier
Release : 2001-12-18
File : 508 Pages
ISBN-13 : 9780080488264


Computer Simulation Of Plasma Surface Chemistry

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Genre :
Author : Bryan Andrew Helmer
Publisher :
Release : 1998
File : 554 Pages
ISBN-13 : UCAL:C3409629


Experimental Beam Studies Of Plasma Surface Interactions

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Genre :
Author : Gowri Prakash Kota
Publisher :
Release : 1998
File : 690 Pages
ISBN-13 : UCAL:C3409703


International Conference On Simulation Of Semiconductor Processes And Devices

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Genre : Semiconductors
Author :
Publisher :
Release : 2005
File : 368 Pages
ISBN-13 : UOM:39015058782403