Application-oriented book on magnetic recording, focussing on the underlying physical mechanisms that play crucial roles in medium and transducer development for high areal density disk drives.

Today magnetic recording is still the leading technology for mass data storage. Its dominant role is being reinforced by the success of cloud computing, which requires storing and managing huge amounts of data on a multitude of servers. Nonetheless, the hard-disk storage industry is presently at a crossroads as the current magnetic recording techno

This book presents the latest research in ultrathin carbon-based protective overcoats for high areal density magnetic data storage systems, with a particular focus on hard disk drives (HDDs) and tape drives. These findings shed new light on how the microstructure and interfacial chemistry of these sub-20 nm overcoats can be engineered at the nanoscale regime to obtain enhanced properties for wear, thermal and corrosion protection – which are critical for such applications. Readers will also be provided with fresh experimental insights into the suitability of graphene as an atomically-thin overcoat for HDD media. The easy readability of this book will appeal to a wide audience, ranging from non-specialists with a general interest in the field to scientists and industry professionals directly involved in thin film and coatings research.

The explosive increase in information and the miniaturization of electronic devices demand new recording technologies and materials that combine high density, fast response, long retention time and rewriting capability. As predicted, the current silicon-based computer circuits are reaching their physical limits. Further miniaturization of the electronic components and increase in data storage density are vital for the next generation of IT equipment such as ultra high-speed mobile computing, communication devices and sophisticated sensors. This original book presents a comprehensive introduction to the significant research achievements on high-density data storage from the aspects of recording mechanisms, materials and fabrication technologies, which are promising for overcoming the physical limits of current data storage systems. The book serves as an useful guide for the development of optimized materials, technologies and device structures for future information storage, and will lead readers to the fascinating world of information technology in the future.

An up-to-date and comprehensive review of magnetic storage systems, including particulate and rigid media, magnetic heads, tribology, signal processing spintronics, and other, future systems. A thorough theoretical discussion supplements the experimental and technical aspects. Each section commences with a tutorial paper, which is followed by technical discussions of current research in the area. Written at a level suitable for advanced graduate students.

These eight papers focus on fundamental issues related to tribology of the head/media interface in magnetic storage devices. The papers address scientific challenges which will enable higher area storage densities through closer spacing between the head/disk interface. These challenges include under

Implementing new architectures and designs for the magnetic recording read channel have been pushed to the limits of modern integrated circuit manufacturing technology. This book reviews advanced coding and signal processing techniques and architectures for magnetic recording systems. Beginning with the basic principles, it examines read/write operations, data organization, head positioning, sensing, timing recovery, data detection, and error correction. It also provides an in-depth treatment of all recording channel subsystems inside a read channel and hard disk drive controller. The final section reviews new trends in coding, particularly emerging codes for recording channels.

An important resource for students, engineers and researchers working in the area of thin film deposition using physical vapor deposition (e.g. sputtering) for semiconductor, liquid crystal displays, high density recording media and photovoltaic device (e.g. thin film solar cell) manufacturing. This book also reviews microelectronics industry topics such as history of inventions and technology trends, recent developments in sputtering technologies, manufacturing steps that require sputtering of thin films, the properties of thin films and the role of sputtering target performance on overall productivity of various processes. Two unique chapters of this book deal with productivity and troubleshooting issues. The content of the book has been divided into two sections: (a) the first section (Chapter 1 to Chapter 3) has been prepared for the readers from a range of disciplines (e.g. electrical, chemical, chemistry, physics) trying to get an insight into use of sputtered films in various devices (e.g. semiconductor, display, photovoltaic, data storage), basic of sputtering and performance of sputtering target in relation to productivity, and (b) the second section (Chapter 4 to Chapter 8) has been prepared for readers who already have background knowledge of sputter deposition of thin films, materials science principles and interested in the details of sputtering target manufacturing methods, sputtering behavior and thin film properties specific to semiconductor, liquid crystal display, photovoltaic and magnetic data storage applications. In Chapters 5 to 8, a general structure has been used, i.e. a description of the applications of sputtered thin films, sputtering target manufacturing methods (including flow charts), sputtering behavior of targets (e.g. current - voltage relationship, deposition rate) and thin film properties (e.g. microstructure, stresses, electrical properties, in-film particles). While discussing these topics, attempts have been made to include examples from the actual commercial processes to highlight the increased complexity of the commercial processes with the growth of advanced technologies. In addition to personnel working in industry setting, university researchers with advanced knowledge of sputtering would also find discussion of such topics (e.g. attributes of target design, chamber design, target microstructure, sputter surface characteristics, various troubleshooting issues) useful. . - Unique coverage of sputtering target manufacturing methods in the light of semiconductor, displays, data storage and photovoltaic industry requirements - Practical information on technology trends, role of sputtering and major OEMs - Discussion on properties of a wide variety of thin films which include silicides, conductors, diffusion barriers, transparent conducting oxides, magnetic films etc. - Practical case-studies on target performance and troubleshooting - Essential technological information for students, engineers and scientists working in the semiconductor, display, data storage and photovoltaic industry

This volume contains the papers presented at the NATO Advanced Research Workshop on "Magnetism and Structure in Systems of Reduced Dimension", held at l'Institut d'Etudes Scientifiques de Cargese - U.M.S. - C.N.R.S. - Universite de Corte Universite de Nice Sophia - Antipolis during June 15-19, 1992. The ordering of papers in the volume reflects the sequence of papers presented at the workshop. The aim was not to segregate the papers into rigidly defmed areas but to group the papers into small clusters, each cluster having a common theme. In this way the parallel, rather than serial, development of areas such as preparation of films, magnetic and structural characterization was highlighted. Indeed the success of the field depends on such parallel development and is assisted by workshops of this nature and the international collaborations which they foster. The organizers and participants of the NATO workshop express their thanks to Mme. Marie-France Hanseier and the staff at l'Institut d'Etudes Scientifiques de Cargese U.M.S. - C.N.R.S. - Universite de Corte - Universite de Nice Sophia - Antipolis for making the workshop and local arrangements a memorable success. Warm thanks are also expressed to Varadachari Sadagopan and Pascal Stefanou for their encouragement and help in making the workshop a reality. We are also grateful to Kristl Hathaway, Larry Cooper and Gary Prinz for advice in developing the workshop program.